Abstract
The good combination of chemical and physical properties of hydrogenated amorphous carbon (a-C:H) coatings makes them suitable for tribological, biomedical and microelectronic applications. In this work, nano-indentation and nano-scratching tests have been used to determine the mechanical properties of a-C:H films produced via plasma chemical vapour deposition from CH4-Ar gas mixtures. A capacitive ion-etching reactor has been used for film deposition with a bias and a mixture composition ranging between 0 V and -400 V and 21.4% and 100%, respectively. The variation of Young's modulus (E) and hardness (H) through film thickness has been assessed by continuous multi-cycle indentations, and sub-surface maxima of approximately 150 GPa and 20 GPa have been measured, respectively. A maximum critical load (Lc) for film delamination of approximately 170 mN has been estimated by nano-scratching. A discussion on bias voltage and mixture composition effect on E, H and Lc is presented.
Original language | English (US) |
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Pages (from-to) | 259-264 |
Number of pages | 6 |
Journal | Surface and Coatings Technology |
Volume | 180-181 |
DOIs | |
State | Published - Mar 1 2004 |
Keywords
- A-C:H films
- Mechanical properties
- Nano-indentation
- Nano-scratching
- PECVD
ASJC Scopus subject areas
- Surfaces, Coatings and Films
- Condensed Matter Physics
- Surfaces and Interfaces