10-nm resolution electron-beam lithography

Harold G. Craighead

doi:10.1063/1.333015

10-nm resolution electron-beam lithography

Harold G. Craighead

Research output: Contribution to journal › Article › peer-review

46 Scopus citations

Abstract

An analytical electron microscope has been used to fabricate a variety of ultrasmall structures and to test the size limits and some basic concepts of high-resolution electron-beam lithography. Arbitrarily shaped patterns on both thin film and bulk substrates have been written with dimensions of approximately 10 nm. A review of devices, structures, materials, and techniques is presented.

Original language	English (US)
Pages (from-to)	4430-4435
Number of pages	6
Journal	Journal of Applied Physics
Volume	55
Issue number	12
DOIs	https://doi.org/10.1063/1.333015
State	Published - Dec 1 1984

ASJC Scopus subject areas

Physics and Astronomy(all)

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10.1063/1.333015

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abstract = "An analytical electron microscope has been used to fabricate a variety of ultrasmall structures and to test the size limits and some basic concepts of high-resolution electron-beam lithography. Arbitrarily shaped patterns on both thin film and bulk substrates have been written with dimensions of approximately 10 nm. A review of devices, structures, materials, and techniques is presented.",

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AB - An analytical electron microscope has been used to fabricate a variety of ultrasmall structures and to test the size limits and some basic concepts of high-resolution electron-beam lithography. Arbitrarily shaped patterns on both thin film and bulk substrates have been written with dimensions of approximately 10 nm. A review of devices, structures, materials, and techniques is presented.

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10-nm resolution electron-beam lithography

Abstract

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