Textured optical storage media

H. G. Craighead; R. E. Howard; R. W. Smith; D. A. Snyder

doi:10.1117/12.933395

Textured optical storage media

H. G. Craighead, R. E. Howard, R. W. Smith, D. A. Snyder

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

A class of optical storage media is described which consists of thin films, microscopically textured by reactive ion etching. These surfaces have random arrays of decoupled columns or cones with cross-sectional dimensions less than 100 nm. This structure yields a spatially varying, graded refractive index resulting in low specular reflectance for visible wavelengths. Reflective spots ~1 μm in diameter have been produced on the surfaces by local melting with a low power laser beam. This has been demonstrated for highly stable materials such as Si and Ge with threshold energies as low as ~1 nJ. The fabrication, microstructure, writing parameters and encapsulation of the media are discussed.

Original language	English (US)
Pages (from-to)	202-205
Number of pages	4
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	329
DOIs	https://doi.org/10.1117/12.933395
State	Published - May 27 1982

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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title = "Textured optical storage media",

abstract = "A class of optical storage media is described which consists of thin films, microscopically textured by reactive ion etching. These surfaces have random arrays of decoupled columns or cones with cross-sectional dimensions less than 100 nm. This structure yields a spatially varying, graded refractive index resulting in low specular reflectance for visible wavelengths. Reflective spots ~1 μm in diameter have been produced on the surfaces by local melting with a low power laser beam. This has been demonstrated for highly stable materials such as Si and Ge with threshold energies as low as ~1 nJ. The fabrication, microstructure, writing parameters and encapsulation of the media are discussed.",

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AU - Craighead, H. G.

AU - Howard, R. E.

AU - Smith, R. W.

AU - Snyder, D. A.

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Y1 - 1982/5/27

N2 - A class of optical storage media is described which consists of thin films, microscopically textured by reactive ion etching. These surfaces have random arrays of decoupled columns or cones with cross-sectional dimensions less than 100 nm. This structure yields a spatially varying, graded refractive index resulting in low specular reflectance for visible wavelengths. Reflective spots ~1 μm in diameter have been produced on the surfaces by local melting with a low power laser beam. This has been demonstrated for highly stable materials such as Si and Ge with threshold energies as low as ~1 nJ. The fabrication, microstructure, writing parameters and encapsulation of the media are discussed.

AB - A class of optical storage media is described which consists of thin films, microscopically textured by reactive ion etching. These surfaces have random arrays of decoupled columns or cones with cross-sectional dimensions less than 100 nm. This structure yields a spatially varying, graded refractive index resulting in low specular reflectance for visible wavelengths. Reflective spots ~1 μm in diameter have been produced on the surfaces by local melting with a low power laser beam. This has been demonstrated for highly stable materials such as Si and Ge with threshold energies as low as ~1 nJ. The fabrication, microstructure, writing parameters and encapsulation of the media are discussed.

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Textured optical storage media

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